中国LaAlO3結晶会社
LaAlO3 crystal factory
LaAlO3 crystal company

LaAlO3

LaAlO3 結晶は、さまざまなペロブスカイト構造材料との格子整合性が高いため、高温超伝導薄膜や巨大磁気抵抗薄膜のエピタキシャル成長用の基板材料です。

製品説明

LaAlO3 is a high temperature superconducting single crystal substrate. It is a good substrate material for epitaxial growth of high temperature superconducting thin films and giant magnetic thin films. Its dielectric properties are suitable for low loss microwave and dielectric resonance applications.

主な利点:

Small dielectric constant

Low dielectric loss

Good lattice matching

Small thermal expansion coefficient

Good chemical stability; wide energy gap

Large specific surface area

Good thermal stability

代表的なアプリケーション:

High temperature superconducting thin film epitaxial substrate; Macro-magnetic thin film epitaxial substrate; Microwave amplification and dielectric resonance



材料特性

化学式 LaAlO3
Growth Method Czochralski
Crystal System Hexagonal (room temperature)
格子定数 Hexagonal a = 5.357Å c = 13.22 Å
Hardness 6.5 Mohs
密度 6.52g/cm3
融点 融点
Thermal Expansion 10×10-6/℃
Loss Tangent (10ghz) ~3×10-4@300K,~0.6×10-4@77K



技術的パラメータ

Dimensions Max Diameter 76.2mm(3 inch)
Thickness 0.5mm other thickness available
Polishing Single or double
Orientation <100><110><111>
Ra Ra≤5Å(5µm×5µm)
Orientation Tolerance  ±0.2°
Orientation Flat 2°(within 1° for special requirement)
Angle of Crystalline Special size and orientation are available upon request

注: 上記のパラメータは参考用です。具体的な要件については、当社の営業担当者にお問い合わせください。

アプリケーション

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