Multi-wavelength Laser Planar Interferometer
+
  • Multi-wavelength Laser Planar Interferometer

Multi-wavelength Laser Planar Interferometer

Based on the principle of Fizeau interference and mechanical phase shifting and equipped with the self-developed super-achromatic beam expanding and imaging system, the interferometer supports the plug and play of laser source with the working wavelength in the range of 600 - 1600 nm.

Keywords:

Multi-wavelength Laser Planar Interferometer

  • Details
  • Characteristics
  • Parameters
  • Application
    • Commodity name: Multi-wavelength Laser Planar Interferometer

    Based on the principle of Fizeau interference and mechanical phase shifting and equipped with the self-developed super-achromatic beam expanding and imaging system, the interferometer supports the plug and play of laser source with the working wavelength in the range of 600 - 1600 nm.

    Based on the principle of Fizeau interference and mechanical phase shifting and equipped with the self-developed super-achromatic beam expanding and imaging system, the interferometer supports the plug and play of laser source with the working wavelength in the range of 600 - 1600 nm.

  • 1.When changing laser source with another wavelength, no adjustment is needed.
    2.The interferometer can be equipped with self-developed absolute test accessories to obtain the absolute surface error of a surface with an accuracy better than λ/40.

  • Technical Parameters Product Series φ300 Phase-Shifting Digital Interferometer φ600 Phase-Shifting Digital Interferometer φ800 Phase-Shifting Digital Interferometer
    Measurement Method Fizeau Interference Principle Fizeau Interference Principle Fizeau Interference Principle
    Measurement Aperture 300mm 600mm 800mm
    Phase shift mode Wavelength phase shift Polarization phase shift or wavelength phase shift Polarization phase shift or wavelength phase shift
    Host wavelength 632.8nm 660nm or 632.8nm 660nm or 632.8nm
    Reference mirror shape error of transmission plane
    (PV)
    ≤λ/10, λ=632.8nm ≤λ/10, λ=632.8nm ≤λ/10, λ=632.8nm
    Reference mirror shape error of reflection plane
    (PV)
    ≤λ/10, λ=632.8nm ≤λ/10, λ=632.8nm ≤λ/10, λ=632.8nm
    Cavity accuracy (PV) ≤λ10, λ=632.8nm ≤λ/10, λ=632.8nm ≤λ/10, λ=632.8nm
    Surface error measurement repeatability ≤1nm (2δ) ≤1nm (2δ) ≤1nm (2δ)
    Main camera resolution 2048*2048 2048*2048 2048*2048
    Main camera focusing capability Yes Yes Yes
    Measure the transmission and reflection wavefront of high parallel optical components Support Support Support
    Working temperature requirements 22℃±1℃ 22℃±1℃ 22℃±1℃
    Working temperature fluctuation requirements Change less than 1℃ per hour Change less than 1℃ per hour Change less than 1℃ per hour
    Working humidity requirements 55%±10%RH 55%±10%RH 55%±10%RH
    Seismic isolation requirements Air floating platform, natural frequency: 1~2Hz Air floating platform, natural frequency: 1~2Hz Air floating platform, natural frequency: 1~2Hz
    Operating voltage 220V 220V 220V

Product Inquiry

Note: Please leave your contact information, our professionals will contact you as soon as possible!

Submit Message

Related Products